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... comprising depositing a hafnium compound by atomic layer deposition to ... Zirconium and/or hafnium ... Method for forming gate insulating layer having ...
To form hafnium nitride by atomic layer deposition, a hafniumcontaining precursor ... 1305N include an insulating nitride layer. ... Zirconium and/or hafnium ...
The metal oxynitride layer is formed from zirconium oxynitride, hafnium ... A metal oxynitride layer formed by atomic layer deposition of a plurality of ...
The zirconium silicon oxide film may be formed by atomic layer deposition. The zirconium ... insulating layer having an atomic ... Atomic layer deposited hafnium ...
... metal layer by atomic layer deposition form a hafnium oxide ... in insulating layer: ... Atomic layer deposited zirconium silicon oxide ...
Electronic apparatus and methods of forming the electronic apparatus include a HfSiON film on a substrate for use in a variety of electronic systems. The HfSiON film ...
An atomic layer deposited ZrAlxOy dielectric ... Zirconium and/or hafnium ... "Atomic layer Deposition of Zirconium Titanium Oxide from Titanium ...
... a zirconium and/or hafniumcontaining layer on ... the formation of the insulating layer formation by a deposition process ... "Atomic layer deposition ...
Atomic layer deposited dielectric layers containing a lanthanum hafnium oxide layer and methods of fabricating such dielectric layers provide an insulating layer in a ...
... provide an insulating layer in a variety of ... hafnium by atomic layer deposition. The hafnium may be deposited ... zirconium oxide atomic layer ...
1. Introduction. Atomic layer deposition (ALD) has recently penetrated research and development lines of several major memory and logic manufacturers due to the ...
... on the hafnium metal layer by atomic layer deposition form a hafnium oxide dielectric ... Atomic layer deposited ... Atomic layer deposited zirconium ...
The metal compounds have surprisingly and significantly improved uniformity when deposited by atomic layer deposition ... Zirconium and/or hafnium ... insulating ...
A dielectric layer containing an atomic layer deposited insulating metal oxide film having multiple ... Genus, Inc. Vertically ... Atomic layer deposition of ...
Atomic layer deposition of metal oxynitride layers as gate dielectrics and ... Atomic layer deposition of hafnium ... Atomic layer deposited zirconium ...
... a zirconium silicon oxide film is formed by atomic layer deposition using a zirconium precursor ... including an insulating layer having a zirconium ... hafnium ...
... Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for ... Hafnium Nitride Using Tetrakis(ethylmethylamino.
... a zirconium and/or hafniumcontaining layer ... using a vapor deposition ... and R″ are each independently an organic group and M is zirconium or hafnium. ...
The hafnium tantalum oxynitride film may be formed using atomic layer deposition. ... metals include hafnium, yttrium, zirconium, ... an insulating nitride layer.
The use of atomic layer deposition ... Forming the dielectric structure includes depositing zirconium oxide using atomic layer deposition using precursor ...
A capacitor structure is formed over a semiconductor substrate by atomic layer deposition ... insulating layer though an atomic ... hafnium oxide and zirconium ...
... such insulating layer may be advantageously used as a passivation layer in ... and an insulating layer deposited on the substrate by Atomic Layer Deposition ...
... "ALD Metal Oxide Deposition Process Using Direct ... ALD metal oxide deposition process using direct oxidation: ... atomic layer deposition of hafnium ...
Atomic layer deposited HfSiON dielectric films wherein each ... Atomic layer deposited zirconium ... oxide and hafnium oxide using atomic layer deposition:
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